Next meeting

Please find the final agenda of our meeting for download below

The next European CMP and WET users group meeting will be held at Dorint Kongress Hotel Chemnitz, Germany on November 30 - December 01, 2023. SAVE THE DATE!

The Dorint Hotel offers 101 nice rooms, 50 of these rooms are blocked for us until November 11. Please make your reservation directly with the hotel as soon as possible. Reservation code is 'CMP WET Chemnitz'. First come - first serve!

If you look for alternatives - there are a good number of other hotels around, most of them in 10 minute walking distance. 

Online registration will be open from October 6 until November 24! Meeting fee is 180,00 € + 19% tax, comes to 214,20€ in total. Please register here:

Paper submission

Please submit title and author(s) of your paper as soon as possible using the button below this text! We accept any technical paper from 10 minutes up to 20 minutes. Please stay technical and do not do commercial advertisements! Technical product presentations and announcements are welcome, too. Please clearly indicate such presentations for what it is! We will try to align that with all other presentations in order to get an interesting and varied program.

Please keep in mind - this is your meeting! Make it interesting and exciting - submit your paper now!  

Agenda

From this year we will change the workshop to a two-half-day event in general! We do not offer single day fee anymore. As desired by many participants, we will offer tutorials for newcomers and everyone who would like to enhance their knowledge in these fields. The agenda will combine technical talks and tutorials in a meaningful way. We will try to set one day for WET topics and the other one for CMP, but we will not stick on a clear separation. Rather we will try to set focus topics in these fields.

Preliminary Workshop Agenda (subject to change - will be updated continuously according incoming talks & topics)

Thursday, November 30

Tutorials

• shifted to next year spring meeting 

Technical presentations & product presentations

• Debottlenecking of wastewater treatment systems – how to make money out of waste; Jochen Ruth, Pall GmbH 

• Advanced DI-water heating with recirculation flow; Nick Rose, Trevor 

• Investigation of cleaning alternatives post CMP with ceria slurry; Sascha Bott, Infineon 

• High efficiency cleaning for Permanent Bonding-based 3D Applications; Don Dussault, ProSys 

• Silicon-direct galvanic; Micker Becker, nb-Technologies 

• Electrochemical deposition of metallic Indium; Conrad Guhl, Fraunhofer IPMS 

Friday, December 01

Tutorials

• W-CMP fundamentals; Federico Barbieri, Entegris

Technical presentations & product presentations

• Summary and highlights ICPT2023 in Kanazawa, Japan; Gerfried Zwicker, zwickerconsult 

• Methods for CMP Process Variation Reduction Using Precision-Engineered Pad Conditioner; Walter Schönhofen, 3M Deutschland GmbH 

• Ebara readiness for SiC CMP; Kenrei Tei, Ebara 

• Subsurface Damage Characterization using Surface Photovoltage Spectroscopy; Imme Ellebrecht, ErzM-Technologies 

• Acting as detective: Investigating the origin of a specific defect in poly CMP; Peter Seidel, Infineon 

• Opening of the Backside of ICs for Failure Analysis Using CMP; Gerfried Zwicker, zwickerconsult 

• Slurry particle size distribution in-line measurement ; Rashid Mavliev, Mavlipa LCC

• Smooth wafer surfaces for dynamic bragg reflectors – how reliable and meaningful are RMS parameters?; Conrad Guhl, Fraunhofer IPMS