If you want to join this group or if you have any questions regarding our activities please send an email to mail@cmpwetug.eu. We will take care of you!
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Catharina Rudolph, Fraunhofer IZM-ASSID, Dresden, Germany
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Catharina.Rudolph(@)assid.izm.fraunhofer.de
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Marie-Christin Wolff, Fraunhofer ISIT, Itzehoe, Germany
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Marie-Christin.Wolff(@)isit.fraunhofer.de
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Imme Ellebrecht, ErzM-Technologies UG, Chemnitz, Germany
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Imme.Ellebrecht(@)erzm-tech.com
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Anke Hanisch, Fraunhofer ENAS, Chemnitz, Germany
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Anke.Hanisch(@)enas.fraunhofer.com |
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Martin Kulawski, Advaplan Oy, Espoo, Finland
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Kulawski(@)advaplan-wafer.com
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Gerfried Zwicker, CMP veteran, Berlin, Germany
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zwickerconsult(@)t-online.de
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Benjamin Steible, Fraunhofer ISIT, Itzehoe, Germany
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Benjamin.Steible(@)isit.fraunhofer.de
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Knut Gottfried, ErzM-Technologies UG & Fraunhofer ENAS, Chemnitz, Germany
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Knut.Gottfried(@)erzm-tech.com
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The European CMP and WET Users Group is in close connection to the Users Groups from the United States, Japan, Korea, Taiwan, and China. Moreover, there is also a strong link to the International Conference on Planarization Technologies (ICPT). The following people represent Europe within the ICPT committees:
Program committee:
Eric Jaquinot, Merck Performance Materials, Trosly-Breuil, France
Catharina Rudolph, Fraunhofer IZM-ASSID, Dresden, Germany
Catherine Euvrard, CEA-Leti, Grenoble, France
Cedric Perrot, CEA-Leti, Grenoble, France
Executive committee
Patrick Ong, IMEC, Leuven, Belgium
Knut Gottfried, Fraunhofer ENAS & ErzM-Technologies UG, Chemnitz, Germany
